- photoresist image patterns
- островки фоторезиста (фоторезистивная маска определённого рисунка)
Англо-русский словарь промышленной и научной лексики. 2014.
photoresist image patterns
Смотреть что такое "photoresist image patterns" в других словарях:
photoengraving — /foh toh en gray ving/, n. 1. a photographic process of preparing printing plates for letterpress printing. 2. a plate so produced. 3. a print made from it. [1870 75; PHOTO + ENGRAVING] * * * Any of several processes for producing printing plates … Universalium
ASML Holding — Infobox Company company name = ASML Holding N.V. company company type = Public (Euronext: [http://www.euronext.com/trader/summarizedmarket/0,5372,1732 6834,00.html?selectedMep=2 idInstrument=21826 isinCode=NL0000334365 ASML] , NASDAQ:… … Wikipedia
Photolithography — For earlier uses of photolithography in printing, see Lithography. For the same process applied to metal, see Photochemical machining. Photolithography (or optical lithography ) is a process used in microfabrication to selectively remove parts of … Wikipedia
Stepper — A stepper is a device used in the manufacture of integrated circuits (ICs) that is similar in operation to a slide projector or a photographic enlarger. Steppers are an essential part of the complex process, called photolithography, that creates… … Wikipedia
Contact lithography — Contact lithography, also known as contact printing, is a form of photolithography whereby the image to be printed is obtained by illumination of a photomask in direct contact with a substrate coated with an imaging photoresist layer. Contents 1… … Wikipedia
Superlens — A superlens, super lens or perfect lens is a lens which uses metamaterials to go beyond the diffraction limit. The diffraction limit is an inherent limitation in conventional optical devices or lenses.[1] In 2000, a type of lens was proposed,… … Wikipedia
Electron beam lithography — (often abbreviated as e beam lithography) is the practice of scanning a beam of electrons in a patterned fashion across a surface covered with a film (called the resist),cite book |last= McCord |first=M. A. |coauthors=M. J. Rooks |title=… … Wikipedia
Color filter array — The Bayer color filter mosaic. Each two by two submosaic contains 2 green, 1 blue and 1 red filter, each covering one pixel sensor. In photography, a color filter array (CFA), or color filter mosaic (CFM), is a mosaic of tiny color filters placed … Wikipedia
Extreme ultraviolet lithography — (also known as EUV or EUVL ) is a next generation lithography technology using the 13.5 nm EUV wavelength. EUVL opticsEUVL is a significant departure from the deep ultraviolet lithography used today. All matter absorbs EUV radiation. Hence, EUV… … Wikipedia
Maskless lithography — In maskless lithography, the radiation that is used to expose a photosensitive emulsion (or photoresist) is not projected from, or transmitted through, a photomask.[1] Instead, most commonly, the radiation is focused to a narrow beam. The beam is … Wikipedia
Ultraviolet — UV redirects here. For other uses, see UV (disambiguation). UVB redirects here. For the mysterious shortwave radio station in Russia, see UVB 76. For other uses, see Ultraviolet (disambiguation). False color image of the Sun s corona as seen in… … Wikipedia
